Tecnosfera Edition reportedthat the Russian Academy of Sciences (IPF RAS) is developing the first domestic lithography facility for the production of microelectronics, including 7nm chips.
The developers of the Russian Academy of Sciences claim that it will take about 6 years to create. Several versions of the installation will be released during this time, including alpha and beta. Now ready, as it is called, only the “prototype of the prototype”. It is capable of creating images on substrates with a resolution up to the limit of 7 nm.
Now only microstructures larger than 65 nanometers can be developed in Russia. In most cases, from 90 nm or more due to extraneous equipment obtained in the 2000s. So creating a structure for 7 nm can be a real revolution within the country.
The Netherlands had already spent 20 years and $ 20 billion building a similar structure. There is still no production for such lithographs in Russia.
