Huawei is still one of the largest manufacturers of Android smartphones: report

Huawei Continuing research into chipset printing technologies and two recent patents suggest that research is progressing rapidly. In addition to this, Huawei is also pursuing new patents for extreme ultraviolet light lithography Cars.

Lithography:

Lithography technology is the most critical stage in chipset manufacturing. The reason chip technology has been able to gradually develop from 100 microns to 3 nm over the past 60 years is due to lithographic machines. Without a lithographic machine, there is no chipset production.

Therefore, Huawei is researching new technologies for printing and chipset manufacturing.

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Let’s take a brief look at these patents.

First patent:

A patent filed on May 13, 2021 has just been published. The technical details of this patent cover technologies related to extreme ultraviolet light.

The details show a lithography device and its control method, which refers to the field of optics and can solve the problem that coherent light cannot be uniformed due to forming a fixed interference pattern.

The reflective surface of the reflective mirror comprises a plurality of micro-reflective surfaces. The plurality of microreflective surfaces includes a first microreflective surface and a second microreflective surface adjacent the first microreflective surface.

There is a height difference Ah between the first microreflective surface and the second microreflective surface, and the height difference Δh is in the range of (0, ka]where λ is the wavelength of extreme ultraviolet light, while k is a positive integer greater than or equal to 1.

Second patent:

The second patent is titled “Mirror, photolithography device and control method”. It has a patent application number CN202110524685.X. This can solve the problem that coherent light cannot be homogenized due to the formation of a fixed interference pattern, which is also a common problem in EUV lithography.

The patent shows a lithography device, which uniforms the accumulated light intensity of the illumination visual field during the exposure time by continuously changing the interference pattern formed by the coherent light.

This will be the device to achieve the goal of uniform light. It also solves the related art problem that light cannot be uniformed due to coherent light forming a fixed interference pattern.

It can be observed that Huawei has been researching to solve the chip neck problem for lithography machines, as it is an essential part of the breakthroughs for chipset development.

Results:

It seems that Huawei is pushing its limits in the field of lithographic machines. Meanwhile, lithography technology shows that Huawei will make a breakthrough, along with other companies in the future.

Therefore, it is possible that Huawei will make a 100% Chinese chipset printing machine in the near future.