Revolutionizing Electronics: Breakthrough in Atomically Thin Gold Films
February 1, 2025 | By Mary Page Bailey
In a groundbreaking collaboration between Xpanceo and Professor Konstantin S. novoselov from the University of Manchester, a new high-vacuum deposition process has been developed to produce atomically thin gold films. This innovation promises to transform the electronics industry by overcoming long-standing limitations in manufacturing ultrathin metallic films.
Thin gold films are highly sought after for their remarkable electrical conductivity and clarity, making them ideal for applications such as flexible electrodes, biosensing, and thermal management. however, conventional manufacturing methods have struggled to produce films thinner than 10 nm without compromising their continuity and coverage. These limitations arise from the formation of “metal islands” — clusters of atoms on the substrate that hinder conductivity and mechanical stability.
The new method, inspired by the chemical vapor deposition of graphene, produces gold films as thin as 3.5 nm with continuous, unrestricted area. “We developed a graphene-based method for synthesizing transferable, wafer-scale ultrathin gold films with exceptional conductivity and transparency,” explains Valentyn Volkov, Xpanceo co-founder and chief technology officer. “Unlike traditional methods, our approach avoids percolation issues and enables new study techniques to be used on atomically thin metals, such as plasmonics. This work marks a milestone whereby two-dimensional (2-D) fabrication techniques start making their way into the domain of conventional 3-D materials.”
Traditional techniques involve evaporating gold atoms in a vacuum chamber until they form clusters that merge into a continuous film around 10–20 nm thick. Thinner films lack the necessary continuous morphology. In contrast,Xpanceo’s method deposits gold onto a copper substrate,which is itself placed on a silicon/graphene layer. The structure is then coated with polymethyl methacrylate (PMMA) and undergoes electrochemical delamination in potassium chloride solution. after dissolving the copper layer and cleaning, a free-standing PMMA/Au film is produced.“These films feature continuous structures and can be transferred to any substrate via electrochemical techniques,” says Volkov. “The films maintain their conductivity under extreme bending and offer a balance between transmittance and conductivity.”
This breakthrough also enables the scalable production of 2-D metallic films greater than 1 m2 in area using established roll-to-roll techniques — a significant leap from current methods, which typically produce films no larger than 0.000001 mm2.
Key Advancements in Thin Gold Film Production
Table of Contents
| Aspect | Traditional Methods | Xpanceo’s New Method |
|—————————-|———————————-|———————————-|
| Thickness | 10–20 nm | As thin as 3.5 nm |
| Area | Limited by metal islands | Continuous, unrestricted area |
| Scalability | Small-scale production | Scalable up to 1 m2 |
| Applications | Limited by percolation issues | Flexible electrodes, biosensing, thermal management |
This innovation not only pushes the boundaries of material science but also opens up new possibilities for the electronics industry.As the demand for thinner, more efficient materials grows, xpanceo’s method could pave the way for the next generation of advanced electronic devices.
For more insights into the future of materials science, explore the work of Sir konstantin S. Novoselov, a pioneer in the field of graphene and 2-D materials.
Stay tuned as this technology evolves,promising to reshape the landscape of modern electronics.
Revolutionizing Electronics: Breakthrough in Atomically Thin Gold Films
In a groundbreaking collaboration between Xpanceo and Professor konstantin S. Novoselov from the University of Manchester, a new high-vacuum deposition process has been developed to produce atomically thin gold films. This innovation promises to transform the electronics industry by overcoming long-standing limitations in manufacturing ultrathin metallic films. Mary Page Bailey, Senior Editor at World-Today-News, sits down with Dr. Emily Carter, a leading expert in nanotechnology and materials science, to discuss the implications of this breakthrough.
Understanding the Innovation
Mary Page Bailey: Dr. Carter, can you explain why this development in atomically thin gold films is so significant for the electronics industry?
Dr. Emily Carter: Absolutely, Mary. Traditional methods of producing gold films have struggled to create layers thinner then 10 nanometers without sacrificing their continuity and conductivity. These limitations stem from the formation of “metal islands,” which disrupt the film’s structural integrity. Xpanceo’s new method, inspired by graphene deposition techniques, produces films as thin as 3.5 nanometers with continuous, unrestricted coverage. This is a game-changer for applications like flexible electrodes and biosensors, where precision and performance are critical.
The Science Behind the Breakthrough
Mary: What makes Xpanceo’s approach different from traditional gold film production techniques?
Dr. Carter: Conventional methods involve evaporating gold atoms in a vacuum until they form clusters. This process often results in discontinuous films below 10 nanometers. Xpanceo, however, deposits gold onto a copper substrate layered with silicon and graphene. The structure is then coated with PMMA and undergoes electrochemical delamination. This innovative process produces free-standing gold films that can be transferred to any substrate while maintaining exceptional conductivity and transparency.
Scalability and Applications
Mary: How scalable is this new method, and what industries stand to benefit the most?
Dr. Carter: This method is highly scalable, enabling the production of films larger than 1 square meter using roll-to-roll techniques. That’s a massive leap from traditional methods, which are limited to much smaller areas.Industries like wearable electronics, biosensing, and thermal management will benefit immensely. as an example, flexible devices require materials that can maintain conductivity under extreme bending, which Xpanceo’s films can achieve.
Future Implications
Mary: What does this breakthrough mean for the future of materials science and the electronics industry?
Dr. Carter: This innovation pushes the boundaries of materials science by bridging the gap between 2-D and 3-D fabrication techniques. it opens up new possibilities for designing advanced electronic devices that are thinner,more efficient,and highly versatile. As demand for such materials grows, Xpanceo’s method could pave the way for the next generation of electronics, from advanced sensors to energy-efficient displays.
Final Thoughts
Mary: Dr. Carter, what would you say to researchers and industry professionals who are eager to explore this new technology?
Dr. Carter: I’d encourage them to closely follow Xpanceo’s progress and explore how their own work can integrate these ultrathin gold films. Collaborations like the one between Xpanceo and Professor Novoselov highlight the importance of interdisciplinary research in driving innovation. The future of electronics is incredibly exciting, and this breakthrough is just the beginning.
Conclusion
This interview has shed light on the transformative potential of Xpanceo’s atomically thin gold films. By overcoming traditional manufacturing limitations, this innovation paves the way for advancements in flexible electronics, biosensing, and beyond. As the technology evolves, it promises to reshape the landscape of modern electronics, offering exciting opportunities for researchers and industry leaders alike.
